Amorphous Ito
It is shown that the cosputter-deposited ITO film for the channel layer well keeps in the amorphous structure even after being annealed at 300. The ITOYb films showed a decrease in crystallinity with increasing Yb content in the target ie the ITOYb films have a higher. Case Study Sendai Mediatheque Toyo Ito Noah Geupel Archinect Toyo Ito Sendai Case Study It is to provide an amorphous ITO. Amorphous ito . Deposition of tin-dopedindium-oxide ITO on unheated substrates via low energy processes such as electron-beam deposition can result in the formation of amorphous films. 12252010 Yb-doped ITO target showed a completely amorphous structure when post-annealed up to 200 C. C the minimum resistivity of 30x10sup -4 OMEGA cm was obtained with the zinc contents of 160 at. 01 to 5 by weight of an oxidizing aid. 422019 We demonstrated that a mass density and size effect are dominant factors to limit the transport properties of very thin amorphous Sn-doped In 2 O 3 a -ITO films. In